International Journal of RF Technologies: Research and Applications

eISSN: 1754-5749pISSN: 1754-5730

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Key Metrics

CiteScore
1.3
SNIP
0.94

Journal Specifications

Overview
  • Publisher
    IOS PRESS
  • Language
    English
  • Frequency
    Semi-annual
General Details
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FAQs

Since when has International Journal of RF Technologies: Research and Applications been publishing? Faqs

The International Journal of RF Technologies: Research and Applications has been publishing since 2008 till date.

How frequently is the International Journal of RF Technologies: Research and Applications published? Faqs

International Journal of RF Technologies: Research and Applications is published Semi-annual.

Who is the publisher of International Journal of RF Technologies: Research and Applications? Faqs

The publisher of International Journal of RF Technologies: Research and Applications is IOS PRESS.

How can I view the journal metrics of International Journal of RF Technologies: Research and Applications on editage? Faqs

For the International Journal of RF Technologies: Research and Applications metrics, please refer to the section above on the page.

What is the eISSN and pISSN number of International Journal of RF Technologies: Research and Applications? Faqs

The eISSN number is 1754-5749 and pISSN number is 1754-5730 for International Journal of RF Technologies: Research and Applications.

Why is it important to find the right journal for my research? Faqs

Choosing the right journal ensures that your research reaches the most relevant audience, thereby maximizing its scholarly impact and contribution to the field.

Can the choice of journal affect my academic career? Faqs

Absolutely. Publishing in reputable journals can enhance your academic profile, making you more competitive for grants, tenure, and other professional opportunities.

Is it advisable to target high-impact journals only? Faqs

While high-impact journals offer greater visibility, they are often highly competitive. It's essential to balance the journal's impact factor with the likelihood of your work being accepted.