Chemical Product and Process Modeling

eISSN: 1934-2659pISSN: 2194-6159

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Key Metrics

CiteScore
1
SJR
Q4Modeling and Simulation

Journal Specifications

Indexed in the following public directories

  • Scopus Scopus
Overview
  • Publisher
    Walter de Gruyter

Year-wise Publication

FAQs

Who is the publisher of Chemical Product and Process Modeling? Faqs

The publisher of Chemical Product and Process Modeling is Walter de Gruyter.

How can I view the journal metrics of Chemical Product and Process Modeling on editage? Faqs

For the Chemical Product and Process Modeling metrics, please refer to the section above on the page.

What is the eISSN and pISSN number of Chemical Product and Process Modeling? Faqs

The eISSN number is 1934-2659 and pISSN number is 2194-6159 for Chemical Product and Process Modeling.

What is the focus of this journal? Faqs

The journal covers a wide range of topics inlcuding Simulation, Mathematical model, Equation of state, Experimental data, Nanocomposite catalyst, Pressure drop, Artificial neural network, Sustainable development, Reynolds number, Proton exchange membrane fuel cell, Environmental technology, Sliding mode control, Thermodynamic model, Nanofluid, Systematic review, Membrane reactor, Workflow, Force closure, Pinch analysis, Kinetic model.

Why is it important to find the right journal for my research? Faqs

Choosing the right journal ensures that your research reaches the most relevant audience, thereby maximizing its scholarly impact and contribution to the field.

Can the choice of journal affect my academic career? Faqs

Absolutely. Publishing in reputable journals can enhance your academic profile, making you more competitive for grants, tenure, and other professional opportunities.

Is it advisable to target high-impact journals only? Faqs

While high-impact journals offer greater visibility, they are often highly competitive. It's essential to balance the journal's impact factor with the likelihood of your work being accepted.