Key Metrics
Journal Specifications
- PublisherELSEVIER
- LanguageEnglish
- FrequencySemi-monthly
- LanguageEnglish
- FrequencySemi-monthly
- Publication Start Year2002
- Publisher URL
- Website URL
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Months | % Papers published |
---|---|
0-3 | 75% |
4-6 | 24% |
7-9 | 1% |
>9 | 0% |
Topics Covered
Year-wise Publication
- 5Y
- 10Y
FAQs
Since when has Applied Surface Science been publishing? 
The Applied Surface Science has been publishing since 2002 till date.
How frequently is the Applied Surface Science published? 
Applied Surface Science is published Semi-monthly.
Who is the publisher of Applied Surface Science? 
The publisher of Applied Surface Science is ELSEVIER.
How can I view the journal metrics of Applied Surface Science on editage? 
For the Applied Surface Science metrics, please refer to the section above on the page.
What is the eISSN and pISSN number of Applied Surface Science? 
The eISSN number is 1873-5584 and pISSN number is 0169-4332 for Applied Surface Science.
What is the focus of this journal? 
The journal covers a wide range of topics inlcuding Carbon, Alloy, Oxide, Monolayer, Electrode, Transition metal, Nanosheet, X-ray, Heterojunction, Rutile, Atomic layer deposition, Contact angle, X-ray photoelectron spectroscopy, Semiconductor, Theory, Hyaluronic acid, Room temperature, Metal, Aqueous solution, Catalytic oxidation.
Why is it important to find the right journal for my research? 
Choosing the right journal ensures that your research reaches the most relevant audience, thereby maximizing its scholarly impact and contribution to the field.
Can the choice of journal affect my academic career? 
Absolutely. Publishing in reputable journals can enhance your academic profile, making you more competitive for grants, tenure, and other professional opportunities.
Is it advisable to target high-impact journals only? 
While high-impact journals offer greater visibility, they are often highly competitive. It's essential to balance the journal's impact factor with the likelihood of your work being accepted.